This class 10 cleanroom fabrication facility comprises 250 sq metres controlled to 21±1°C with a relative humidity of 40±5% with a raised floor being used as the air return to the plenum.  Each bay is serviced with DI, town and chilled water, nitrogen, compressed air, power, gases and vacuum.

The cleanroon is well equiped with lithography, dry etch, metalisation, wet decks and inspection  tools with upto wafer 200mm capability